CVD Diamond/Monocrystalline Silicon Carbide window photochemistry Reactor

CVD Diamond/Monocrystalline Silicon Carbide window photochemistry Reactor Suitable process: photocatalytic fluorination reaction、photocatalysis above 220nm、laser photocatalysis

  • Temperature range: -
  • Pressure tolerance: -
  • Flow rate: -
  • Flexible volume: -
  • Summary: -

CVD Diamond/Monocrystalline Silicon Carbide window photochemistry Reactor

Total Flow Rate: O-10 mL/min

Max Pressure: Customization of Window Material Thickness

Wetted parts: PFA/PEEK,SIC/cvd diamond

39VWX|093eW !

Process Fluid Ports:1/4"UNF-28 fat bottom

Customizable services: Equipped with temperature control structure

Suitable process: photocatalytic fluorination reaction、photocatalysis above 220nm、laser photocatalysis